Obama visited Austin on Thursday, and here you see him reflected in a huge 450mm wafer, produced by Intel using the Molecular Imprints nanolithography tool. This is the first system capable of patterning such large wafers, and it pushes the resolution below 24 nanometers.
Unlike traditional lithography tools which shine light through a patterned shadow mask, Molecular Imprints presses a 3D master plate of quartz into a liquid that photo-cures to a solid. It’s like a 3D printing press. That it can scale so wide and deep is a bit counter-intuitive, but that was the vision of the founders when we first invested in 2002.
President Obama:
“We want the next revolution in manufacturing to be ‘Made in America.’ We’re going to do that.”
“That’s America. We innovate. We adapt. We move forward… And that’s what I want to keep on promoting as your President of the United States of America.“
Patterned by the Imprio 450
These are BIG wafers… especially compared to the 
Leave a Reply